About ABCD Technology

Founded in 2006, ABCD Technology Sarl is a Swiss spin-off from EPFL (Swiss federal Institute of Technology, Lausanne). It provides to its customer's unique equipment to deposit top quality and disruptive oxide thin films. Highly agile and powerful, “Sybilla” equipment combines the possibility to deposit multi-element and multi-functional thin films with either unprecedented homogeneity on large substrates or disruptive 3D-architectures by combining the use of combinatorial and 3D-printing additive facilities, enabling improved performances or totally new devices. In other words, we foster your future devices with unmatched material properties towards new functionalities, miniaturization and integration capacities in the “More than Moore” vision.




Who We Are

ABCD Technology is part of a network of sister companies with complementary skills to provide a complete and optimized solution to the highly challenging thin film deposition field. Our staff owns, among others, state of the art know-how and skills in a vacuum, thin-film growth, organometallic chemistry, optics, laser and particle beams, material science and nanotechnologies, in addition to the top skills in mechanical engineering required to build such equipment. To correctly address this complexity, the strategy has been to grow a strong network of partners to pursue parallel development of complementary specific expertise and know-how. These competencies and expertise are distributed in several interconnected, but independent companies, each one strongly focused on its core competencies and core business. This strong network of highly specialized interacting skills and competencies makes of ABCD Technology’s disruptive Sybilla equipment a tremendous opportunity and an unmatched solution for the most demanding thin-film developers and adopters.


What We Do

ABCD Technology SYBILLA series thin film deposition equipment are based on Chemical Beam Epitaxy (CBE) technique, merging high agility and flexibility for R&D purposes with a robust methodology for production. They allow to produce high-quality complex thin films for mature and emerging markets such as (but not limited to) microelectronics, photonics, optronics, renewable energies, catalysis, bio-compatible coatings, or decorative coatings. Our equipment is particularly well-optimized to address multi-element oxide thin films, highly eco-sustainable materials, that display a plethora of different functional properties, but III-V or II-VI semiconductors can also be grown.
Chemical Beam Epitaxy (CBE) is a line-of-sight deposition technique to grow thin films using chemical precursors in a high vacuum (below 10-5 mbar). It was developed in the 1980’s from the merging of MBE (Molecular Beam Epitaxy) and CVD (Chemical Vapor Deposition) to deposit III-V semiconductor thin films. Several names have been attributed to slightly different versions of the technique such as Gas Sources MBE (GSMBE), Metal-organic MBE (MOMBE), High-vacuum CVD (HV-CVD) or Chemical Beam Vapour Deposition (CBVD).
CBE (and its variant techniques) have demonstrated excellent results over the years as reported in the literature, proving experimentally their advantages over competitor techniques. We can quote for Sybilla equipment among others the following main results.

R&D Equipment and Main Facilities

Company strong network of highly specialized interacting skills and competencies means ABCD’s disruptive solution represents a tremendous opportunity for the most demanding thin film developers.

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